Initial and Long-Term Frequency Degradation on Ring Oscillators from Plasma Induced Damage in 65 nm Bulk and Silicon On Thin BOX processes
نویسندگان
چکیده
Degradation of reliability caused by plasma induced damage (PID) has become a significant concern with miniaturizing a device size. In this paper, we measure frequencies of ring oscillators with an antenna structure on a single stage. In bulk, PID is relieved by connecting an antenna to a drain because electric charge flow to a substrate. The difference of initial frequencies is 0.79 % between structures which cause and relieve PID. A Silicon On Thin BOX (SOTB) which has a buried oxide of less than 10 nm also relieves PID. Initial frequencies are affected by PID but there is no effect of PID in a long-term degradation mainly caused by bias temperature instability (BTI).
منابع مشابه
Initial and long-term frequency degradation of ring oscillators caused by plasma-induced damage in 65nm bulk and fully depleted silicon-on-insulator processes
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Degradations of reliability caused by plasma induced damage (PID) have become a significant concern with miniaturizing a device size. In this paper, we measure frequencies of ring oscillators with an antenna structure on a single stage. PID is relieved by connecting an antenna to a drain because charge flows to a substrate. The difference of initial frequencies is 0.64 % between structures whic...
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